{"id":3646,"date":"2026-08-09T23:58:14","date_gmt":"2026-08-09T15:58:14","guid":{"rendered":"https:\/\/blog.zengqq.com.cn\/?p=3646"},"modified":"2026-08-09T23:58:15","modified_gmt":"2026-08-09T15:58:15","slug":"how-to-use-dose_dat-caculate-pcomp","status":"publish","type":"post","link":"https:\/\/blog.zengqq.com.cn\/?p=3646","title":{"rendered":"How to use Dose_dat Caculate Pcomp"},"content":{"rendered":"\n<h2>Overview<\/h2>\n<p>The <code>dose.dat<\/code> file can be used to verify whether the pressure compensation value is accurate for production wafers in Axcelis ion implantation systems [1]. This technique allows process engineers to calculate and optimize PCOMP values through data analysis rather than solely relying on experimental trial methods.<\/p>\n\n<h2>Step-by-Step Procedure<\/h2>\n\n<h3>Step 1: Data Preparation<\/h3>\n<p>Extract the following two key parameters from the <code>dose.dat<\/code> file generated during implantation into photoresist-coated wafers [1]:<\/p>\n\n<table>\n  <thead>\n    <tr>\n      <th>COLUMN<\/th>\n      <th>DESCRIPTION<\/th>\n      <th>SOURCE<\/th>\n    <\/tr>\n  <\/thead>\n  <tbody>\n    <tr>\n      <td>Disk Faraday Current (I<sub>measured<\/sub>)<\/td>\n      <td>The measured beam current readback value recorded by the disk faraday cup [1]<\/td>\n      <td>dose.dat file<\/td>\n    <\/tr>\n    <tr>\n      <td>IG3 Pressure Reading (P)<\/td>\n      <td>Vacuum pressure reading from Ion Gauge 3 located in the end station [1]<\/td>\n      <td>dose.dat file<\/td>\n    <\/tr>\n  <\/tbody>\n<\/table>\n\n<p>Create two new calculated columns:<\/p>\n<ul>\n  <li>Natural logarithm of the disk faraday current: ln(I<sub>measured<\/sub>) [1]<\/li>\n  <li>Normalized IG3 pressure value P (in appropriate units) [1]<\/li>\n<\/ul>\n\n<h3>Step 2: Create Scatter Plot<\/h3>\n<p>Using spreadsheet software or data analysis tools, plot your processed data as follows [1]:<\/p>\n<ul>\n  <li><strong>X-axis:<\/strong> End station vacuum pressure (P, from IG3 gauge) [1]<\/li>\n  <li><strong>Y-axis:<\/strong> Natural logarithm of beam current ln(I<sub>measured<\/sub>) [1]<\/li>\n  <li><strong>Chart Type:<\/strong> Scatter plot to show individual measurement points during the implantation cycle [1]<\/li>\n<\/ul>\n\n<h3>Step 3: Linear Fitting to Extract k-Factor<\/h3>\n<p>Fit a straight line through your plotted data points using linear regression. The slope of this fitted line represents the pressure compensation coefficient <em>k<\/em> [1].<\/p>\n\n<h4>Mathematical Foundation<\/h4>\n<p>The underlying physics is described by the following pressure compensation formula for standard Axcelis systems [1]:<\/p>\n\n<blockquote>\n  <p>I<sub>actual<\/sub> = I<sub>measured<\/sub> \u00b7 e<sup>(k \u2212 P)<\/sup><\/p>\n<\/blockquote>\n\n<p>Taking the natural logarithm of both sides transforms this into a linear equation:<\/p>\n\n<blockquote>\n  <p>ln(I<sub>actual<\/sub>) = ln(I<sub>measured<\/sub>) + k \u2212 P<\/p>\n<\/blockquote>\n\n<p>Where:<\/p>\n\n<table>\n  <thead>\n    <tr>\n      <th>SYMBOL<\/th>\n      <th>DESCRIPTION<\/th>\n      <th>SOURCE<\/th>\n    <\/tr>\n  <\/thead>\n  <tbody>\n    <tr>\n      <td>I<sub>actual<\/sub><\/td>\n      <td>Pressure-compensated beam current (appears as <code>pcompI<\/code> in the Dose.dat file) [1]<\/td>\n      <td>Formula derivation<\/td>\n    <\/tr>\n    <tr>\n      <td>I<sub>measured<\/sub><\/td>\n      <td>Raw measured beam current from disk faraday readback [1]<\/td>\n      <td>dose.dat column &#8220;diskI&#8221;<\/td>\n    <\/tr>\n    <tr>\n      <td>P<\/td>\n      <td>Pressure reading from IG3 ion gauge [1]<\/td>\n      <td>dose.dat pressure columns (e.g., end_hcig)<\/td>\n    <\/tr>\n    <tr>\n      <td>k<\/td>\n      <td>Linear fitting slope = Pressure Compensation Factor [2]<\/td>\n      <td>Calculated result<\/td>\n    <\/tr>\n  <\/tbody>\n<\/table>\n\n<h3>Step 4: Convert k-Factor to PCOMP Recipe Value<\/h3>\n<p>After obtaining the k-factor from your linear fit, convert it to the actual recipe parameter using this formula for standard pressure compensation mode [1]:<\/p>\n\n<blockquote>\n  <p><strong>PCOMP = 100 \u00d7 (e<sup>k<\/sup> \u2212 1)<\/strong><\/p>\n<\/blockquote>\n\n<h2>Important Technical Notes<\/h2>\n\n<h3>Pressure Compensation Modes<\/h3>\n\n<table>\n  <thead>\n    <tr>\n      <th>MODE<\/th>\n      <th>COMPLEXITY<\/th>\n      <th>RECOMMENDATION<\/th>\n    <\/tr>\n  <\/thead>\n  <tbody>\n    <tr>\n      <td>Standard PCOMP<\/td>\n      <td>Linear fitting is valid [1]<\/td>\n      <td>Use above formula<\/td>\n    <\/tr>\n    <tr>\n      <td>Gamma Pressure Compensation<\/td>\n      <td>Fitting becomes significantly more complicated due to non-linear response<\/td>\n      <td>Requires alternative methods or vendor consultation [1]<\/td>\n    <\/tr>\n  <\/tbody>\n<\/table>\n\n<h3>Physical Mechanism Behind the Data Pattern<\/h3>\n<p>The <code>dose.dat<\/code> file reveals a characteristic pattern that validates this calculation method:<\/p>\n<ol>\n  <li>As the ion beam hits wafers with photoresist, outgassing begins and vacuum pressure rises immediately [2].<\/li>\n  <li>Simultaneously, measured beam current decreases due to charge-exchange neutralization reactions (ions capture electrons from gas molecules) [1][3].<\/li>\n  <li>When implantation continues beyond peak outgassing, the effect gradually diminishes as resist desorption slows down.<\/li>\n<\/ol>\n\n<h2>Verification<\/h2>\n<p>After calculating PCOMP using this method:<\/p>\n<ul>\n  <li>Compare your calculated pressure-compensated beam current (I<sub>actual<\/sub> or <code>pcompI<\/code>) against expected values [2].<\/li>\n  <li>Verify that compensated current shows minimal standard deviation during implant (ideally constant throughout) rather than varying with end station pressure fluctuations [3].<\/li>\n<\/ul>\n\n<h2>Recommended Resources for Further Study<\/h2>\n<p>For more detailed information on Dose.dat analysis and PCOMP determination, refer to these Axcelis documentation sources:<\/p>\n<ul>\n  <li><em>Best Methods and Practices for Determining Pressure Compensation Factors Using Dose_dat Software<\/em> (Part Number 9510721) [1]<\/li>\n  <li><em>Dose Theory and Pressure Compensation on Axcelis GSD High Current Implanter<\/em> \u2013 Published paper by Infineon Technologies AG, IEEE Proceedings [3]<\/li>\n<\/ul>\n\n<h2>References<\/h2>\n<ol>\n  <li>Axcelis Dose_dat Training Documentation, File ID: 150d0f20-2e1e-440d-8506-e684b7f7355d<\/li>\n  <li>most detail for IMPL training.pdf \u2013 Axcelis Process Lab Documentation, File ID: 21a3f7ab-a105-4906-8372-3660bd997da7<\/li>\n  <li>Kraupner J., Kyek A., Vogl J., Weiss S. &#8220;Dose Theory and Pressure Compensation on Axcelis GSD High Current Implanter&#8221; \u2013 IEEE Proceedings, 2002<\/li>\n<\/ol>\n\n<h2>Summary for Students<\/h2>\n<p>When explaining this to your students, emphasize these key teaching points:<\/p>\n<ul>\n  <li>PCOMP is necessary because photoresist outgassing causes variable pressure, which creates neutralization reactions that distort dose uniformity.<\/li>\n  <li>The disk faraday cup measures electric charge (current), but not the actual particle flux of dopants reaching the wafer surface.<\/li>\n  <li>Dose.dat analysis provides a data-driven, non-destructive method to validate or optimize PCOMP without splitting production lots for experimental measurements.<\/li>\n<\/ul>\n","protected":false},"excerpt":{"rendered":"<p>Overview The dose.dat fil [&#8230;]<\/p>\n","protected":false},"author":2,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[89],"tags":[],"class_list":["post-3646","post","type-post","status-publish","format-standard","hentry","category-live"],"_links":{"self":[{"href":"https:\/\/blog.zengqq.com.cn\/index.php?rest_route=\/wp\/v2\/posts\/3646","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/blog.zengqq.com.cn\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/blog.zengqq.com.cn\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/blog.zengqq.com.cn\/index.php?rest_route=\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/blog.zengqq.com.cn\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=3646"}],"version-history":[{"count":1,"href":"https:\/\/blog.zengqq.com.cn\/index.php?rest_route=\/wp\/v2\/posts\/3646\/revisions"}],"predecessor-version":[{"id":3647,"href":"https:\/\/blog.zengqq.com.cn\/index.php?rest_route=\/wp\/v2\/posts\/3646\/revisions\/3647"}],"wp:attachment":[{"href":"https:\/\/blog.zengqq.com.cn\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=3646"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/blog.zengqq.com.cn\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=3646"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/blog.zengqq.com.cn\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=3646"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}